工藝資訊
Cleanliness Levels of NFF (CWB) Equipment (Click HERE to download)
1. Thermal Diffusion and Implantation Module
2. Dry Etching and Sputtering Module
3. Wet Etching and CMP Module
4. Photolithography Module
Remark:
Blue : Equipment in NFF (CWB)-EC (EC-01000)
Black: Equipment in NFF (CWB)-Phase 2 (P2-10000, P2-01000 and P2-00100)
Green: Equipment in TSV Process Laboratory (Rm. 2227)
Red: Equipment in Deep RIE Process Center (Rm. 2223)
Brown: Equipment for Microfluidic Process in NFF (CWB)-Phase 2
Purple: Equipment in Nanofabrication Demonstration Laboratory (NDL) (Rm. 3114)
Training Type 1: Peer-to-peer training
Training Type 2: Self-learning with practice
Training Type 3: Training class
1. Thermal Diffusion and Implantation Module
Process code |
Location |
Equipment |
Cleanliness level |
Who operates |
Training type |
Cleaning |
1st Responsible Staff |
2nd Responsible Staff |
CVD |
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| CVD-A2 | P2-01000 | LPCVD-A2 Doped Amor-Si | Clean | Staff | NA | A3+SRD-A | Eric LAW | Ho LI/ Redford MAN |
| CVD-A3 | P2-01000 | LPCVD-A3 Amor-Si/Poly | Clean | Staff | NA | A3+SRD-A | Eric LAW | Ho LI/ Redford MAN |
| CVD-B1 | P2-01000 | LPCVD-B1 Low-Stress Nitride | Clean | Staff | NA | A3+SRD-A | Eric LAW | Ho LI/ Redford MAN |
| CVD-B2 | P2-01000 | LPCVD-B2 Nitride | Clean | Staff | NA | A3+SRD-A | Eric LAW | Ho LI/ Redford MAN |
| CVD-B3 | P2-01000 | LPCVD-B3 LTO | Clean | Staff | NA | A3+SRD-A | Eric LAW | Ho LI/ Redford MAN |
| CVD-A4 | P2-01000 | LPCVD-A4 Si-Ge / Amor-Si / Poly | Semi-Clean | Staff | NA | B1+SRD-B D1 (dump-rinser) |
Eric LAW | Ho LI/ Redford MAN |
| CVD-B4 | P2-01000 | LPCVD-B4 LTO / PSG | Semi-Clean | Staff | NA | B1+SRD-B D1 (dump-rinser) |
Eric LAW | Ho LI/ Redford MAN |
| CVD-HTO | P2-01000 | LPCVD HTO | Clean | Staff | NA | A3+SRD-A | Eric LAW | Ho LI |
| CVD-P3 | P2-01000 | Oxford PECVD | Semi-Clean | Qualified Lab User | Type 1 | B1+SRD-B D1 (dump-rinser) |
Ho LI | Redford MAN |
| CVD-P2 | P2-01000 | STS PECVD | Non-Standard | Qualified Lab User | Type 1 & 2 | B1+SRD-B/D1 (dump-rinser)/F (dump-rinser) | Ho LI | Redford MAN |
| CVD-CNT | P2-01000 | CNT PECVD | Non-Standard | Qualified Lab User | Type 1 & 2 | B1+SRD-B/D1 (dump-rinser)/F (dump-rinser) | Ho LI | Redford MAN |
| CVD-ALD | P2-01000 | Oxford ALD | Non-Standard | Qualified Lab User | Type 1 & 2 | B1+SRD-B/D1 (dump-rinser)/F (dump-rinser) | Ho LI | Redford MAN |
| CVD-ALD-2 | P2-01000 | NFF ALD | Semi-Clean | Qualified Lab User | Type 1 & 2 | B1+SRD-B/D1 (dump-rinser) | Ho LI | Redford MAN |
| CVD-ALD-3 | P2-01000 | Fiji ALD | Semi-Clean | Staff | NA | B1+SRD-B/D1 (dump-rinser) | Eric LAW | Ho LI |
Thermal Diffusion |
||||||||
| DIF-C1 | P2-01000 | Diff. Furnace-C1 FGA Annealing | Non-Standard | Staff | NA | B1+SRD-B/D1 (dump-rinser)/F (dump-rinser) | Eric LAW | Ho LI/ Redford MAN |
| DIF-C2 | P2-01000 | Diff. Furnace-C2 N Pre-Deposition | Clean | Staff | NA | A3+SRD-A | Eric LAW | Ho LI/ Redford MAN |
| DIF-C3 | P2-01000 | Diff. Furnace-C3 P Pre-Deposition | Clean | Staff | NA | A3+SRD-A | Eric LAW | Ho LI/ Redford MAN |
| DIF-D1 | P2-01000 | Diff. Furnace-D1 Dry Oxidation | Clean (Only for gate oxide) | Staff | NA | A3+SRD-A | Eric LAW | Ho LI/ Redford MAN |
| DIF-A1 | P2-01000 | Diff. Furnace-A1 Annealing/Dry/Wet Oxidation | Clean | Staff | NA | A3+SRD-A | Eric LAW | Ho LI/ Redford MAN |
| DIF-D2 | P2-01000 | Diff. Furnace-D2 Annealing/Dry/Wet Oxidation | Clean | Staff | NA | A3+SRD-A | Eric LAW | Ho LI/ Redford MAN |
| DIF-D3 | P2-01000 | Diff. Furnace-D3 Annealing/Dry/Wet Oxidation | Non-Standard | Staff | NA | B1+SRD-B/D1 (dump-rinser)/F (dump-rinser) | Eric LAW | Ho LI/ Redford MAN |
| DIF-F1 | P2-01000 | Diff. Furnace-F1 Annealing/Dry/Wet Oxidation | Semi-Clean | Staff | NA | B1+SRD-B D1 (dump-rinser) |
Eric LAW | Ho LI/ Redford MAN |
| DIF-C4 | P2-01000 | Diff. Furnace-C4 FGA Annealing | Semi-Clean | Staff | NA | B1+SRD-B D1 (dump-rinser) |
Eric LAW | Ho LI/ Redford MAN |
| DIF-R1 | P2-01000 | RTP-600S | Clean | Qualified Lab User | Type 1 & 3 | A3+SRD- A | Ho LI | Redford MAN |
| DIF-R2 | P2-01000 | AG610 RTP | Semi-Clean | Qualified Lab User | Type 1 & 3 | B1+SRD-B D1 (dump-rinser) |
Ho LI | Redford MAN |
DIF-R3 |
EC-01000 |
AW610 RTP |
Non-Standard |
Qualified Lab User | Type 1 & 3 | M1(dump-rinser)+ N2 dry |
Victor LEE |
Peter PUN |
Implantation |
||||||||
| IMP-3000 | P2-01000 | CF-3000 Implanter | Clean/Semi-Clean | Staff | NA | Ho LI | Redford MAN | |
2. Dry Etching and Sputtering Module
* Remark: For Semi-Clean process of "Poly Etcher", please contact NFF(CWB) technicians. |
||||||||
Process
code |
Location |
Equipment |
Cleanliness level |
Who operates |
Training type |
Remark |
1st Responsible Staff |
2nd Responsible Staff |
Dry Etching |
||||||||
| DRY-AOE | P2-01000 | AOE Etcher | Clean | Qualified Lab User | Type 1 & 3 | Etch material: SiO2 | Brial KWOK | Peter PUN |
| DRY-Si-1 | P2-01000 | DRIE Etcher #1 | Clean | Qualified Lab User | Type 1 & 3 | Brial KWOK | Peter PUN | |
DRY-Si-2 |
Rm. 2223 |
DRIE Etcher #2 |
Clean/Semi-Clean |
Qualified Lab User | Type 3 | Redford MAN | Brial KWOK | |
DRY-Si-3 |
Rm. 2223 |
DRIE Etcher #3 |
Non-Standard |
Qualified Lab User | Type 1 & 3 | Brial KWOK | Redford MAN | |
| DRY-Poly | P2-01000 | Poly Etcher | Clean/Semi-Clean * | Qualified Lab User | Type 1 & 3 | Brial KWOK | William XIE | |
| DRY-XeF2-2 | P2-01000 | Memsstar XeF2 Silicon Etcher | Clean/Semi-Clean | Qualified Lab User | Type 1 & 3 | Brial KWOK | William XIE | |
| DRY-Trion | P2-01000 | Trion RIE Etcher | Semi-Clean | Qualified Lab User | Type 1 & 2 | Peter PUN | Brial KWOK | |
| DRY-Metal-1 | P2-01000 | AST Metal Etcher | Semi-Clean | Qualified Lab User | Type 1 & 3 | Peter PUN | Brial KWOK | |
| DRY-Metal-2 | P2-01000 | Oxford Aluminum Etcher | Semi-Clean | Qualified Lab User | Type 1 & 3 | Peter PUN | Brial KWOK | |
| DRY-Metal-3 | P2-01000 | Samco ICP Metal Etcher | Non-Standard | Qualified Lab User | Type 1 & 3 | Etch materials: Metal and metal compounds only | Meko TSOI | Brial KWOK |
| DRY-GaN | P2-01000 | GaN Etcher | Non-Standard | Qualified Lab User | Type 1 & 3 | Brial KWOK | Peter PUN | |
| DRY-GaN-2 | P2-01000 | Oxford GaN-InP Etcher | Semi-Clean * | Qualified Lab User | Type 1 & 3 | Sunny LAO | William XIE | |
| DRY-Oxide | P2-01000 | Oxford Oxide Etcher | Non-Standard | Qualified Lab User | Type 1 & 3 | Accept Cr mask; not for etching metals | Sunny LAO | William XIE |
DRY-RIE-1 |
EC-01000 |
Oxford RIE Etcher |
Non-Standard |
Qualified Lab User | Type 1 & 3 | Victor LEE | Peter PUN | |
| DRY-RIE-2 | P2-01000 | NFF RIE Etcher | Clean/Semi-Clean | Qualified Lab User | Type 1 & 3 | Peter PUN | Meko TSOI | |
DRY-Cleaner |
P2-01000 |
Diener Plasma Cleaner |
Non-Standard |
Qualified Lab User | Type 1 & 2 | Microfluidic user only |
Meko TSOI |
Sunny LAO/ |
Photoresist O2 Asher |
||||||||
| DRY-PR-2 | P2-01000 | IPC 3000 Asher #1 | Semi-Clean | Qualified Lab User | Type 1 & 2 | Peter PUN | Brial KWOK | |
| DRY-PR-3 | P2-01000 | IPC 3000 Asher #2 | Non-Standard | Qualified Lab User | Type 1 & 2 | Peter PUN | Brial KWOK | |
DRY-PR-4 |
EC-01000 |
IPC 3000 Asher #3 |
Non-Standard |
Qualified Lab User | Type 1 & 2 | Victor LEE | Peter PUN | |
| DRY-PR-5 | P2-01000 | IPC 3000 Asher #4 | Clean | Qualified Lab User | Type 1 & 2 | Peter PUN | Brial KWOK | |
Sputtering & Evaporation |
||||||||
| SPT-3180 | P2-01000 | Varian 3180 Sputter | Semi-Clean | Staff | NA | William XIE | Brial KWOK | |
| SPT-CY1 | P2-01000 | NFF-CY Sputter #1 | Semi-Clean | Qualified Lab User | Type 1 & 3 | Peter PUN | Redford MAN | |
| SPT-CY2 | P2-01000 | NFF-CY Sputter #2 | Non-Standard | Qualified Lab User | Type 1 & 3 | Victor LEE | Redford MAN | |
| SPT-ARC | P2-01000 | ARC-12M Sputter | Non-Standard | Qualified Lab User | Type 1 & 3 | Brial KWOK | William XIE | |
| SPT-CVC | P2-01000 | CVC-601 Sputter | Non-Standard | Qualified Lab User | Type 1 & 3 | Brial KWOK | Peter PUN | |
SPT-EV2 |
EC-01000 |
Cooke Evaporator #2 |
Non-Standard |
Qualified Lab User | Type 1 & 3 | Victor LEE | Peter PUN | |
SPT-AST600 |
EC-01000 |
AST 600EI Evaporator |
Non-Standard |
Qualified Lab User | Type 1 & 3 | Victor LEE | Peter PUN | |
SPT-AST450 |
EC-01000 |
AST 450I Evaporator |
Non-Standard |
Qualified Lab User | Type 1 & 3 | Victor LEE | Peter PUN | |
3. Wet Etching and CMP Module
Process
code |
Location |
Equipmment |
Cleanliness Level |
Who operates |
Training type |
Remark |
1st Responsible Staff |
2nd Responsible Staff |
CMP |
||||||||
CMP-4 |
Rm. 2227 |
Buehler Polisher #1 |
Semi-Clean |
Qualified Lab User | Type 1 & 2 | Henry YEUNG | Sunny LAO | |
CMP-5 |
Rm. 2227 |
Buehler Polisher #2 |
Non-Standard |
Qualified Lab User | Type 1 & 2 | Henry YEUNG | Sunny LAO | |
| CMP-6 | P2-10000 | GnP CMP | Clean | Qualified Lab User | Type 1 & 2 | Henry YEUNG | Sunny LAO | |
Wet-station |
||||||||
| Wetstation A - Sulfuric Cleaning Station | ||||||||
| WET-A1 | P2-01000 | A1: Sulfuric Cleaning (NFF reserved) | Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| WET-A2 | P2-01000 | A2:HF:H20 (1:50) | Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| WET-A3 | P2-01000 | A3: Sulfuric Cleaning | Clean | Qualified Lab User | Type 1 & 2 | ONLY for "Clean" furnace and RTP | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
| SRD-A | P2-01000 | Spin Dryer-A | Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| Wetstation B - Sulfuic Cleaning/Decontamination Station | ||||||||
| WET-B1 | P2-01000 | B1:Sulfuric Cleaning | Clean | Qualified Lab User | Type 1 & 2 | NOT for "Clean" furnace and RTP | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
| WET-B2 | P2-01000 | B2:HF:H20(1:50) | Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| WET-B3 | P2-01000 | B3:Decontamination | Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| SRD-B | P2-01000 | Spin Dryer-B | Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| Wetstation C - Oxide/Nitride Etching Station | ||||||||
| WET-C1 | P2-01000 | C1:Nitride Strip | Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| WET-C2 | P2-01000 | C2:Oxide Deglaze/PSG Removal | Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| WET-C3 | P2-01000 | C3:BOE | Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| SRD-C | P2-01000 | Spin Dryer-C | Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| Wetstation D - Semi-Clean Metal Processing Station | ||||||||
| WET-D1 | P2-01000 | D1:Aluminum Etch | Semi-Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| WET-D2 | P2-01000 | D2:HF:H2O(1:100) MILC | Semi-Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| WET-D3 | P2-01000 | D3:General Purpose | Semi-Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| SRD-D | P2-01000 | Spin Dryer-D | Semi-Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| Wetstaton E - Semi-Clean Non-metal Processing Station | ||||||||
| WET-E1 | P2-01000 | E1:General Purpose | Semi-Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| WET-E3 | P2-01000 | E3:HF:H2O(1:100) | Semi-Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| WET-E4 | P2-01000 | E4:Resist Strip | Clean/Semi-Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| SRD-E | P2-01000 | Spin Dryer-E | Clean/Semi-Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| Wetstation F - Non-Standard Processing Station | ||||||||
| WET-F1 | P2-01000 | F1:General Purpose | Non-Standard | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| WET-F2 | P2-01000 | F2:General Purpose | Non-Standard | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| WET-F3 | P2-01000 | F3:General Purpose | Non-Standard | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| SRD-F | P2-01000 | Spin Dryer-F | Non-Standard | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| Wetstation G - TMAH Etching Station | ||||||||
| WET-G1 | P2-01000 | G1:TMAH | Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| WET-G2 | P2-01000 | G2:TMAH | Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| SRD-G | P2-01000 | Spin Dryer-G | Clean | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| Wetstation J - TMAH/KOH Etching Station | ||||||||
| WET-J1 | P2-01000 | J1:TMAH/KOH Etching | Non-Standard | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
| WET-J2 | P2-01000 | J2:TMAH/KOH Etching | Non-Standard | Qualified Lab User | Type 1 & 2 | Michael KWOK | Olive CHAN/ Sunny LAO/ Henry YEUNG |
|
Wetstation M - Non-Standard Organic Solvent Station |
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WET-M1 |
EC-01000 |
M1:MS2001 Resist Strip |
Non-Standard |
Qualified Lab User | Type 1 & 2 | Victor LEE | Peter PUN | |
WET-M2 |
EC-01000 |
Branson 5510 |
Non-Standard |
Qualified Lab User | Type 1 & 2 | Victor LEE | Peter PUN | |
WET-M3 |
EC-01000 |
M3:MS2001 Mask Cleaning |
Non-Standard |
Qualified Lab User | Type 1 & 2 | Victor LEE | Peter PUN | |
Wetstation O - Non-Standard Hydrochloric Acid Etch Station |
||||||||
WET-O1 |
EC-01000 |
O1: HCl |
Non-Standard |
Qualified Lab User | Type 1 & 2 | Victor LEE | Peter PUN | |
| Wetstation W - Non-Standard Organic Solvent Station | ||||||||
| WET-W1 | P2-00100 | W1:MS2001 Resist Strip | Non-Standard | Qualified Lab User | Type 1 & 2 | Olive CHAN | Sunny LAO/ Henry YEUNG |
|
| WET-W2 | P2-00100 | W2:FHD-5 | Non-Standard | Qualified Lab User | Type 1 & 2 | Olive CHAN | Sunny LAO/ Henry YEUNG |
|
| SRD-W | P2-00100 | Spin Dryer-W | Non-Standard | Qualified Lab User | Type 1 & 2 | Olive CHAN | Sunny LAO/ Henry YEUNG |
|
| Wetstation X - Clean Organic Solvent Station | ||||||||
| WET-X1 | P2-00100 | X1:General Purpose | Clean | Qualified Lab User | Type 1 & 2 | Olive CHAN | Sunny LAO/ Henry YEUNG |
|
| WET-X2 | P2-00100 | X2:General Purpose | Clean | Qualified Lab User | Type 1 & 2 | Olive CHAN | Sunny LAO/ Henry YEUNG |
|
| Wetstation Y - Semi-Clean Organic Solvent Station | ||||||||
| WET-Y1 | P2-00100 | Y1:MS2001 Resist Strip | Semi-Clean | Qualified Lab User | Type 1 & 2 | Olive CHAN | Sunny LAO/ Henry YEUNG |
|
| WET-Y2 | P2-00100 | Y2:MS2001 Mask Cleaning | Semi-Clean | Qualified Lab User | Type 1 & 2 | Olive CHAN | Sunny LAO/ Henry YEUNG |
|
| SRD-Y | P2-00100 | Spin Dryer-Y | Semi-Clean | Qualified Lab User | Type 1 & 2 | Olive CHAN | Sunny LAO/ Henry YEUNG |
|
| Wetstation Z - Semi-Clean/Non-Standard Organic Solvent Station | ||||||||
| WET-Z1 | P2-00100 | Z1:FHD-5 | Semi-Clean | Qualified Lab User | Type 1 & 2 | Olive CHAN | Sunny LAO/ Henry YEUNG |
|
| WET-Z2 | P2-00100 | Z2:Dump Rinser | Semi-Clean/Non-Standard | Qualified Lab User | Type 1 & 2 | Olive CHAN | Sunny LAO/ Henry YEUNG |
|
Critical Point Dryer |
||||||||
CPD-1 |
NDL-10000 |
Critical Point Dryer |
Semi-Clean |
Qualified Lab User | Type 1 & 3 | Brial KWOK | Meko TSOI | |
Electroplating |
||||||||
EP-1 |
Rm. 2227 |
Copper Electroplating |
Non-Standard |
Staff | NA | Michael KWOK | Sunny LAO | |
4. Photolithography Module
Process
code |
Location |
Equipmment |
Cleanliness Level |
Who operates |
Training type |
Remark |
1st Responsible Staff |
2nd Responsible Staff |
| Ultrasonic Bath | ||||||||
| PHT-U1 | P2-00100 | Branson 5510 | Semi-Clean | Qualified Lab User | NA | Olive CHAN | Sunny LAO/ Henry YEUNG |
|
| PHT-U2 | P2-00100 | Branson 3510 | Non-Standard | Qualified Lab User | NA | Olive CHAN | Sunny LAO/ Henry YEUNG |
|
| Stepper/Aligner | ||||||||
| PHT-S1 | P2-00100 | ASML Stepper | Clean/Semi-Clean | Staff | NA | Henry YEUNG | Olive CHAN/ Sunny LAO |
|
| PHT-A2 | P2-00100 | AB-M Aligner #2(UV) | Semi-Clean/Non-Standard | Qualified Lab User | Type 1 & 2 | Sunny LAO | Olive CHAN/ Henry YEUNG |
|
PHT-A5 |
EC-01000 |
Karl Suss MA6 #1 |
Non-Standard |
Qualified Lab User | Type 1 & 2 | Victor LEE | Peter PUN | |
| PHT-A7 | P2-00100 | Karl Suss MA6 #2 | Clean/Semi-Clean | Qualified Lab User | Type 1 & 2 | Sunny LAO | Olive CHAN/ Henry YEUNG |
|
| PHT-A9 | P2-00100 | Heidelberg Maskless Aligner µMLA | Non-Standard | Qualified Lab User | Type 1 & 2 | Allow AZ1505, AZ703 and AZ7908 Photoresist only | Olive CHAN | Sam LAI |
EMW-1 |
EC-00100 |
JEOL JBX-6300FS E-Beam Lithography System |
All Level |
Staff | NA | Nelson LI | Victor LEE | |
| PHT-P1 | P2-01000 | Nanoscribe 3D Printer | All Level | Qualified Lab User | Type 1 & 3 | Henry YEUNG | Sunny LAO | |
| PHT-N1 | P2-01000 | NILT Nanoimprint | Clean/Semi-Clean | Qualified Lab User | Type 1 &2 | Henry YEUNG | Sunny LAO | |
| Bonder | ||||||||
| PHT-B2 | P2-00100 | Karl Suss Bonder XB8 | Non-Standard | Staff | NA | Henry YEUNG | Sunny LAO | |
| PHT-B3 | P2-00100 | SET ACCµRA100 Flip-Chip Bonder | Non-Standard | Staff | NA | Sunny LAO | Henry YEUNG | |
| Coater and Track | ||||||||
| PHT-T1 | P2-00100 | SVG88 Coater Track | Clean/Semi-Clean | Qualified Lab User | Type 1 & 2 | Sunny LAO | Olive CHAN/ Henry YEUNG |
|
| PHT-T2 | P2-00100 | SVG88 Developer Track | Clean/Semi-Clean | Qualified Lab User | Type 1 & 2 | Sunny LAO | Olive CHAN/ Henry YEUNG |
|
| PHT-SC3 | P2-00100 | CEE Coater | Clean/Semi-Clean | Qualified Lab User | Type 1 & 2 | Sunny LAO | Olive CHAN/ Henry YEUNG |
|
| PHT-SC1 | P2-00100 | SUSS Coater | Semi-Clean/Non-Standard | Qualified Lab User | Type 1 & 2 | Sunny LAO | Olive CHAN/ Henry YEUNG |
|
| PHT-SC2 | P2-00100 | Desktop Coater | Non-Standard | Qualified Lab User | Type 1 & 2 | Sunny LAO | Olive CHAN/ Henry YEUNG |
|
| PHT-SC5 | P2-00100 | EVG Spray Coater | All Level | Qualified Lab User | Type 1 & 2 | Henry YEUNG | Olive CHAN | |
PHT-SC4 |
EC-01000 |
Solitec Coater #1 |
Non-Standard |
Qualified Lab User | Type 1 & 2 | Victor LEE | Peter PUN | |
PHT-SC6 |
P2-01000 |
Laurell PDMS Coater |
Non-Standard |
Qualified Lab User | Type 1 & 2 | Microfluidic user only |
Henry YEUNG |
Sunny LAO |
PHT-MX1 |
P2-01000 |
Kurabo PDMS Mixer/Deaerator |
Non-Standard |
Qualified Lab User | Type 1 & 2 | Microfluidic user only |
Henry YEUNG |
Sunny LAO |
| Oven | ||||||||
| PHT-O3 | P2-00100 | Imperial V (105C) | Clean/Semi-Clean | Qualified Lab User | NA | NA | NA | |
| PHT-O4 | P2-00100 | Oven-C (120C) | Clean/Semi-Clean | Qualified Lab User | NA | NA | NA | |
| PHT-O6 | P2-00100 | Oven-A (180C) | Clean/Semi-Clean | Qualified Lab User | NA | NA | NA | |
| PHT-O7 | P2-00100 | Oven-B (80C) | Clean/Semi-Clean | Qualified Lab User | NA | NA | NA | |
| PHT-O1 | P2-00100 | Grieve | Non-Standard | Qualified Lab User | NA | NA | NA | |
| PHT-O2 | P2-00100 | Shellab (120C) | Non-Standard | Qualified Lab User | NA | NA | NA | |
| PHT-O5 | P2-00100 | Vacuum Oven | Non-Standard | Qualified Lab User | Type 1 & 2 | NA | NA | |
PHT-O8 |
EC-01000 |
Oven-D (120C) |
Non-Standard |
Qualified Lab User | NA | NA | NA | |
PHT-O9 |
EC-01000 |
Oven-E (105C) |
Non-Standard |
Qualified Lab User | NA | NA | NA | |
PHT-O10 |
P2-01000 |
Oven-F (80C) |
Non-Standard |
Qualified Lab User | NA | Microfluidic user only |
NA |
NA |
| PHT-O11 | P2-01000 | Unitemp Reflow Oven | Non-Standard | Qualified Lab User | Type 1 & 2 | Flip Chip user only | Sunny LAO | Henry YEUNG |
| Hotplate | ||||||||
| PHT-HP1 | P2-00100 | Sawatec Hot Plate | Clean/Semi-Clean | Qualified Lab User | NA | NA | NA | |
| PHT-HP2 | P2-00100 | SUSS Hot Plate | Clean/Semi-Clean | Qualified Lab User | NA | NA | NA | |
| PHT-HP9 | P2-00100 | CEE Hot Plate #1(110C) | Clean/Semi-Clean | Qualified Lab User | NA | NA | NA | |
| PHT-HP3 | P2-00100 | Hot Plate-C | Non-Standard | Qualified Lab User | NA | NA | NA | |
| PHT-HP4 | P2-00100 | Hot Plate-D | Non-Standard | Qualified Lab User | NA | NA | NA | |
PHT-HP5 |
EC-01000 |
EMS Hot Plate #1 (50C) |
Non-Standard |
Qualified Lab User | NA | NA | NA | |
PHT-HP6 |
EC-01000 |
CEE Hot Plate #2 (90C) |
Non-Standard |
Qualified Lab User | NA | NA | NA | |
PHT-HP7 |
EC-01000 |
Hot Plate (110C) |
Non-Standard |
Qualified Lab User | NA | NA | NA | |
| PHT-HP8 | P2-00100 | EMS Hot Plate #2 (50C) | Non-Standard | Qualified Lab User | NA | NA | NA | |
| HMDS Primer | ||||||||
| PHT-HM1 | P2-00100 | HMDS Primer #1 | Non-Standard | Qualified Lab User | NA | NA | NA | |
| PHT-HM2 | P2-00100 | HMDS Primer #2 | Clean/Semi-Clean | Qualified Lab User | NA | NA | NA | |
PHT-HM3 |
EC-01000 |
HMDS Primer #3 |
Non-Standard |
Qualified Lab User | NA | NA | NA | |